Metrology apparatus, lithographic apparatus and method of measuring a property of a substrate
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| Main Authors | , , , |
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| Format | Patent |
| Language | Chinese English |
| Published |
11.06.2013
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| Subjects | |
| Online Access | Get full text |
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| Author | DEN BOEF, ARIE JEFFREY VAN ASTEN, NICOLAAS ANTONIUS ALLEGONDUS JOHANNES VAN DE KERKHOF, MARCUS ADRIANUS VAN DER MAST, KAREL DIEDERICK |
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| Notes | Application Number: TW20080151092 |
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| RelatedCompanies | ASML NETHERLANDS B. V |
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| SubjectTerms | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| Title | Metrology apparatus, lithographic apparatus and method of measuring a property of a substrate |
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