Metrology apparatus, lithographic apparatus and method of measuring a property of a substrate

• Main Authors: VAN DE KERKHOF, MARCUS ADRIANUS, VAN ASTEN, NICOLAAS ANTONIUS ALLEGONDUS JOHANNES, VAN DER MAST, KAREL DIEDERICK, DEN BOEF, ARIE JEFFREY
• Format: Patent
• Language: Chinese; English
• Published: 11.06.2013
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS