Lithographic apparatus and device manufacturing method

A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatu...

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Bibliographic Details
Main Authors BUURMAN, ERIK PETRUS, TEEUWSEN, JOHANNES WILHELMUS MARIA CORNELIS, MOEST, BEARRACH, HAAST, MARC ANTONIUS MARIA, CASTENMILLER, THOMAS JOSEPHUS MARIA
Format Patent
LanguageChinese
English
Published 11.04.2008
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTRIC COMMUNICATION TECHNIQUE
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PICTORIAL COMMUNICATION, e.g. TELEVISION
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Summary:A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
Bibliography:Application Number: TW200695110133