Lithographic apparatus and method to detect correct clamping of an object
Disclosed is a lithographic apparatus (1) comprising a support structure (MT; WT) adapted to clamp an object (W; MA; 5). The support structure (MT; WT) and the object (W; MA; 5) clamped thereon define a compartment. Supply means (11) are connected to the compartment and supply a fluid to the compart...
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Main Author | |
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Format | Patent |
Language | English |
Published |
11.03.2007
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Subjects | |
Online Access | Get full text |
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Abstract | Disclosed is a lithographic apparatus (1) comprising a support structure (MT; WT) adapted to clamp an object (W; MA; 5). The support structure (MT; WT) and the object (W; MA; 5) clamped thereon define a compartment. Supply means (11) are connected to the compartment and supply a fluid to the compartment. The supply means (11) comprise a meter (15) to measure a change in at least one of flow velocity of the fluid and pressure of the fluid. |
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AbstractList | Disclosed is a lithographic apparatus (1) comprising a support structure (MT; WT) adapted to clamp an object (W; MA; 5). The support structure (MT; WT) and the object (W; MA; 5) clamped thereon define a compartment. Supply means (11) are connected to the compartment and supply a fluid to the compartment. The supply means (11) comprise a meter (15) to measure a change in at least one of flow velocity of the fluid and pressure of the fluid. |
Author | NEERHOF, HENDRIK ANTONY JOHANNES |
Author_xml | – fullname: NEERHOF, HENDRIK ANTONY JOHANNES |
BookMark | eNqNiksKwjAQQLPQRf3cYS7gQouI20rFgsuCyzIm0zbSZoZkvL9BPICrB--9lVkEDlSY5u515CGijN4CimBEfSfA4GCmnBwogyMlq2A5xi8nnMWHAbjPI_Dzle3GLHucEm1_XBu41u3ltiPhjpKgpUDatY_mcDqe92VVlX8sH6ZXNmU |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
ExternalDocumentID | TWI275913BB |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_TWI275913BB3 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 15:03:22 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_TWI275913BB3 |
Notes | Application Number: TW200493102769 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070311&DB=EPODOC&CC=TW&NR=I275913B |
ParticipantIDs | epo_espacenet_TWI275913BB |
PublicationCentury | 2000 |
PublicationDate | 20070311 |
PublicationDateYYYYMMDD | 2007-03-11 |
PublicationDate_xml | – month: 03 year: 2007 text: 20070311 day: 11 |
PublicationDecade | 2000 |
PublicationYear | 2007 |
RelatedCompanies | ASML NETHERLANDS B.V |
RelatedCompanies_xml | – name: ASML NETHERLANDS B.V |
Score | 2.6588924 |
Snippet | Disclosed is a lithographic apparatus (1) comprising a support structure (MT; WT) adapted to clamp an object (W; MA; 5). The support structure (MT; WT) and the... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
Title | Lithographic apparatus and method to detect correct clamping of an object |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070311&DB=EPODOC&locale=&CC=TW&NR=I275913B |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3JTsMwEB2Vst6gUFE2-YByi6jjLOQQIWWpWkQXoUB7q2LHUXtJKpKK38d2GuACJ0tja-RFz8uM5w3AveE6HDuc6VRc8HXTsiydEpzprJ9kNs_S1GXSozue2MM383lhLVqwamJhFE_opyJHFIhiAu-V2q83P0asUP2tLB_oWoiKp0HshVrzOpZs7FgLfS-aTcNpoAWBF8-1yas3MhzLxcTfg315iZYs-9G7L2NSNr8PlMEpHMyErrw6gxbPO3AcNHnXOnA03rm7O3Co_meyUgh3GCzPYfSyrlY10fSaoWSjyLu3JUryFNX5oFFVoJRL7wBiMvmGLMXCy8goVGSiISqoNL9cABpEcTDURe-W3xOxjOfNMHzShXZe5PwSECOMuwlO0r7AFscZfbQFcolLXU4tw7R70PtTzdU_dddwUhsyiY7xDbSrjy2_FSdwRe_U5H0BVEaMmg |
link.rule.ids | 230,309,786,891,25594,76906 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT4NAEJ7U-qg3RRvrcw-GG7ELBeRATIA2rfYVg7a3hl2WlAs0QuPfd3cp6kVPm8xuJvvIt4-ZnW8A7nXHZthmVCP8gq_1TNPUiIETjXajxGJJHDtUeHQnU2v41ntemssGrOtYGMkT-inJETmiKMd7KffrzY8RK5B_K4sHknJR_jQI3UCtX8eCjR2rgef257Ng5qu-74YLdfrqjnTbdLDh7cG-Lbh5xcXp3RMxKZvfB8rgBA7mXFdWnkKDZQq0_DrvmgJHk527W4FD-T-TFly4w2BxBqNxWq4roumUomgjybu3BYqyGFX5oFGZo5gJ7wCiIvmGKPnCi8golCe8IcqJML-cAxr0Q3-o8d6tvidiFS7qYXhGG5pZnrELQNSgzIlwFHc5thhOyKPFkWs4xGHE1HtWBzp_qrn8p-4OWsNwMl6NR9OXKziujJqGhvE1NMuPLbvhp3FJbuVEfgEQy4-H |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Lithographic+apparatus+and+method+to+detect+correct+clamping+of+an+object&rft.inventor=NEERHOF%2C+HENDRIK+ANTONY+JOHANNES&rft.date=2007-03-11&rft.externalDBID=B&rft.externalDocID=TWI275913BB |