Lithographic apparatus and method to detect correct clamping of an object

Disclosed is a lithographic apparatus (1) comprising a support structure (MT; WT) adapted to clamp an object (W; MA; 5). The support structure (MT; WT) and the object (W; MA; 5) clamped thereon define a compartment. Supply means (11) are connected to the compartment and supply a fluid to the compart...

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Bibliographic Details
Main Author NEERHOF, HENDRIK ANTONY JOHANNES
Format Patent
LanguageEnglish
Published 11.03.2007
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:Disclosed is a lithographic apparatus (1) comprising a support structure (MT; WT) adapted to clamp an object (W; MA; 5). The support structure (MT; WT) and the object (W; MA; 5) clamped thereon define a compartment. Supply means (11) are connected to the compartment and supply a fluid to the compartment. The supply means (11) comprise a meter (15) to measure a change in at least one of flow velocity of the fluid and pressure of the fluid.
Bibliography:Application Number: TW200493102769