Lithographic projection apparatus and article holder therefor

A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; an article holder comprising a plurality of protrusions defining a protrusion configuration arranged to provide a flat plane of support for supporting a substantially flat article to be p...

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Bibliographic Details
Main Authors VAN EMPEL, TJARKO ADRIAAN RUDOLF, ZAAL, KOEN JACOBUS JOHANNES MARIA, OTTENS, JOOST JEROEN, HOPMAN, JAN
Format Patent
LanguageEnglish
Published 01.05.2006
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; an article holder comprising a plurality of protrusions defining a protrusion configuration arranged to provide a flat plane of support for supporting a substantially flat article to be placed in a beam path of said projection beam of radiation, the article holder comprising at least one clamping electrode for generating an electrostatic clamping force, for clamping an article against the article holder. According to the invention, said at least one clamping electrode comprises an electric field changing structure for locally changing said electrostatic clamping force for leveling local height variations of said substrate.
Bibliography:Application Number: TW20040121914