Semiconductor integrated circuit device and process for manufacturing the same
This invention provides a semiconductor integrated circuit device including a DRAM having fine memory cells and a reduced bit line capacitance. A side wall insulating film of a gate electrode 7 (word line WL) is constructed by a side wall insulating film 10 made of silicon nitride and a side wall in...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
01.11.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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