Semiconductor integrated circuit device and process for manufacturing the same

This invention provides a semiconductor integrated circuit device including a DRAM having fine memory cells and a reduced bit line capacitance. A side wall insulating film of a gate electrode 7 (word line WL) is constructed by a side wall insulating film 10 made of silicon nitride and a side wall in...

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Bibliographic Details
Main Authors ENOMOTO, HIROYUKI, YAMADA, SATORU, OYU, KIYONORI, TOKUNAGA, TAKAFUMI, SEKIGUCHI, TOSHIHIRO
Format Patent
LanguageEnglish
Published 01.11.2002
Edition7
Subjects
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