Caliper apparatus

A kind of caliper apparatus is disclosed in the present invention. The invented caliper apparatus is featured with having an inner diameter smaller than the inner wall diameter of the reaction chamber in the plasma etching-machine and having the design of horizontal level. By using the invented cali...

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Bibliographic Details
Main Authors FAN, BING-LIN, LIOU, DE-SHIANG, JIAN, RUEI-RUNG
Format Patent
LanguageEnglish
Published 01.09.2002
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A kind of caliper apparatus is disclosed in the present invention. The invented caliper apparatus is featured with having an inner diameter smaller than the inner wall diameter of the reaction chamber in the plasma etching-machine and having the design of horizontal level. By using the invented caliper apparatus, micro-particles generated by scratching the reaction chamber inner wall due to the baffle plate can be prevented such that it is assured that the wafer is truly placed with a horizontal state without the occurrence of inclined situation.
Bibliography:Application Number: TW20010124865