Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
A technique includes a process container configured to process a substrate, a storage container which is at least partially in contact with an outer wall of the process container and is configured to store a gas to be supplied into the process container, and a temperature regulator configured to reg...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
16.04.2024
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Subjects | |
Online Access | Get full text |
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