Uniform in situ cleaning and deposition

• Main Authors: ZHANG, YU-XING, NGUYEN, TUAN A, BANSAL, AMIT, RAMAMURTHI, BADRI N, PATHAK, NITIN, RATHI, SAKET, KHAJA, ABDUL AZIZ, BOBEK, SARAH MICHELLE
• Format: Patent
• Language: Chinese; English
• Published: 16.01.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Exemplary semiconductor processing systems may include an output manifold that defines at least one plasma outlet. The systems may include a gasbox disposed beneath the output manifold. The gasbox may include an inlet side facing the output manifold and an outlet side opposite the inlet side. The ga...