Device and method for cleaning a gas stream

• Main Authors: CHEN, YING-LIANG, CHEN, CHING-PIN, HSU, CHANG-GUO, LAI, TING-HAO
• Format: Patent
• Language: Chinese; English
• Published: 16.09.2023
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; NOZZLES; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SEPARATION; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

The invention relates to a device (6), preferably in the form of a wet scrubber, for cleaning a stream of gas by removing gaseous, liquid and solid impurities, preferably fine and ultrafine solid particles, said device comprising a gas inlet and a gas outlet (9), characterized in that the device (6) has at the gas inlet a first structured packing (19), a spray-scrubber area with atomizing nozzles (18) above this structured packing (19), a first demister (16) for separating larger drops above the spray-scrubber area, a woven fabric (11) that is above the first demister (16), with spray nozzles (12) which are arranged around this woven fabric and which spray washing liquid in the direction of the gas stream onto the surface of the woven fabric (11), and a final demister (10) that is above the woven fabric (11) and that has a demister rinsing apparatus (20).