Methods and mechanisms for process recipe optimization

An electronic device manufacturing system configured to performing, by manufacturing equipment, a first process on a first substrate according to a process recipe, wherein the process recipe comprises a plurality of setting parameters. The system then generates metrology data associated with a plura...

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Bibliographic Details
Main Author PACK, ROBERT C
Format Patent
LanguageChinese
English
Published 01.09.2023
Subjects
BASIC ELECTRIC ELEMENTS
CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
PHYSICS
REGULATING
SEMICONDUCTOR DEVICES
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Summary:An electronic device manufacturing system configured to performing, by manufacturing equipment, a first process on a first substrate according to a process recipe, wherein the process recipe comprises a plurality of setting parameters. The system then generates metrology data associated with a plurality of features and inputs the metrology data into one or more Bayesian probabilistic models. The system then receives an output from the one or more Bayesian probabilistic models based on the metrology data and at least one settings parameter of the plurality of setting parameters. The system then updates, based on the output of the one or more Bayesian probabilistic models, the process recipe by modifying at least one setting parameter of the plurality of setting parameters, and performs, by the manufacturing equipment, a second process on a second substrate according to the updated process recipe.
Bibliography:Application Number: TW202211141785