Extreme ultraviolet source

• Main Authors: CHIEN, SHANGIEH, LIU, HENG-HSIN, HUANG, YUIH, TSAI, MING-HSUN, CHEN, YU-HUAN
• Format: Patent
• Language: Chinese; English
• Published: 01.03.2023
• Subjects: ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; X-RAY TECHNIQUE

A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tu...