Extreme ultraviolet source
A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tu...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
01.03.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tube is arranged within the nozzle of the droplet generator, and the nozzle tube includes a structured nozzle pattern configured to provide an angular momentum to the target droplets. |
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Bibliography: | Application Number: TW202110148640 |