Photomask, method for making same, and exposure method

Embodiments of the present application provide a photomask, a method for making the photomask, and an exposure method. The photomask includes: a transparent substrate having a first surface; a patterned light shielding layer on the first surface; and a diffusion layer on a side of the substrate away...

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Bibliographic Details
Main Authors CHEN, MIAO-TING, HUNG, YU-MIN
Format Patent
LanguageChinese
English
Published 01.03.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:Embodiments of the present application provide a photomask, a method for making the photomask, and an exposure method. The photomask includes: a transparent substrate having a first surface; a patterned light shielding layer on the first surface; and a diffusion layer on a side of the substrate away from the light shielding layer. The diffusion layer includes light diffusing particles.
Bibliography:Application Number: TW202110130971