Apparatus and method for characterizing a microlithographic mask

• Main Authors: WEI, SHAOI, THALER, THOMAS, RUOFF, JOHANNES, FELDMANN, HEIKO, MATEJKA, ULRICH, PERLITZ, SASCHA, BLUMRICH, JOERG FREDERIK, DEGUENTHER, MARKUS
• Format: Patent
• Language: Chinese; English
• Published: 01.02.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS THEREFOR; MEASURING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TESTING

The invention relates to an apparatus and a method for characterizing a microlithographic mask. According to one aspect, an apparatus according to the invention comprises at least one light source (105, 205, 405a, 405b, 605) which emits coherent light, an illumination optical unit (110, 210, 310, 31...