Etching system

• Main Authors: ANGLIN, KEVIN R, RUFFELL, SIMON, VERRIER, KEVIN
• Format: Patent
• Language: Chinese; English
• Published: 16.08.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A system and method for etching workpieces in a uniform manner are disclosed. Specifically, an etching system is disclosed. The system includes a semiconductor processing system that generates a ribbon ion beam, and a workpiece holder that scans the workpiece through the ribbon ion beam. The workpie...