EUV light source and method of cleaning a target material debris deposits in an EUV light source

• Main Authors: EVANS, DAVID ROBERT, GAZZA, JACK MICHAEL, BAEK, JONG-HOON, ABRAHAM, MATHEW CHEERAN
• Format: Patent
• Language: Chinese; English
• Published: 01.12.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; X-RAY TECHNIQUE

A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized...