Anodized titanium material and production method therefor

Provided is an anodized titanium material that exhibits improved voltage resistance. This anodized titanium material comprises a titanium matrix and an anodized titanium layer provided on the surface of the titanium matrix, wherein: the anodized titanium layer includes a first porous anodized titani...

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Main Authors MURANAKA, TAKEHIKO, UENO, YUUTA, KIKUCHI, HIKARU, NIIMI, KOUJI, SAITO, HIDETO, NAGAYAMA, NOBUYUKI
Format Patent
LanguageChinese
English
Published 01.06.2020
Subjects
APPARATUS THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
SEMICONDUCTOR DEVICES
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Summary:Provided is an anodized titanium material that exhibits improved voltage resistance. This anodized titanium material comprises a titanium matrix and an anodized titanium layer provided on the surface of the titanium matrix, wherein: the anodized titanium layer includes a first porous anodized titanium layer and has a withstand voltage of at least 500 V at 25 DEG C, a Vickers hardness of at least 200, a film thickness not less than 20 [mu]m but less than 80 [mu]m, an arithmetic average surface roughness Ra of less than 1.6 [mu]m, and a maximum-height surface roughness Rz of less than 6.3 [mu]m; and no pore cross-sections of a shape in which a circle having a dimeter of at least 0.5 [mu]m can be encompassed is observed either in the surface or a cross-section perpendicular to the thickness direction of the first anodized titanium layer.
Bibliography:Application Number: TW20198128359