Plasma processing apparatus

• Main Authors: HASHIMOTO, TAKAHISA, ISOZAKI, MASAKAZU
• Format: Patent
• Language: Chinese; English
• Published: 16.05.2020
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

A plasma processing apparatus includes: a vacuum chamber in which plasma is formed; an inner chamber detachable from the vacuum chamber; a sample stage disposed in the inner chamber; a sample stage ring base disposed in the inner chamber; and a suspension beam coupled to the sample stage ring base i...