Deposition apparatus of capacitor and deposition method of dielectric layer using the same
Disclosed is a method of manufacturing a capacitor having a high dielectric constant, which prevents a surface of a dielectric layer from being deteriorated due to a vacuum break and prevents the quality of a dielectric layer from being degraded due to a physical stress occurring when a semiconducto...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
16.05.2017
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed is a method of manufacturing a capacitor having a high dielectric constant, which prevents a surface of a dielectric layer from being deteriorated due to a vacuum break and prevents the quality of a dielectric layer from being degraded due to a physical stress occurring when a semiconductor substrate is being loaded and unloaded. |
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Bibliography: | Application Number: TW20165123719 |