Electron injector and free electron laser

• Main Authors: AKKERMANS, JOHANNES ANTONIUS GERARDUS, NIKIPELOV, ANDREY ALEXANDROVICH, LOOPSTRA, ERIK ROELOF, COENEN, TEIS JOHAN, BANINE, VADIM YEVGENYEVICH, FRIJNS, OLAV WALDEMAR VLADIMIR, DE JAGER, PIETER WILLEM HERMAN, BARTRAIJ, PETRUS RUTGERUS, OP'T ROOT, WILHELMUS PATRICK ELISABETH MARIA, GRIMMINCK, LEONARDUS ADRIANUS GERARDUS, DE VRIES, GOSSE CHARLES, KATALENIC, ANDELKO, ENGELEN, WOUTER JOEP
• Format: Patent
• Language: Chinese; English
• Published: 16.08.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; DEVICES USING STIMULATED EMISSION; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS

An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.