Method for manufacturing patterned layer and method for manufacturing electrochromic device

Disclosed herein is a method for manufacturing a patterned layer. The method includes the steps of: providing a substrate which has a first surface and a second surface opposite to the first surface; providing a material source for supplying a plurality of charged particles, in which the first surfa...

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Bibliographic Details
Main Authors LIN, TINGUN, HSIEH, HAO-LUN, TU, CHUN-HAO, JHAN, REN-HONG, KUNG, KUO-SEN, TSENG, JEN-PEI
Format Patent
LanguageChinese
English
Published 01.03.2015
Subjects
BASIC ELECTRIC ELEMENTS
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Summary:Disclosed herein is a method for manufacturing a patterned layer. The method includes the steps of: providing a substrate which has a first surface and a second surface opposite to the first surface; providing a material source for supplying a plurality of charged particles, in which the first surface of the substrate faces the material source; providing a magnetic element, in which the second surface is arranged between the magnetic element and the first surface; and depositing the charged particles on the first surface through using the magnetic element so as to form a patterned layer. A method for manufacturing an electrochromic device is disclosed as well.
Bibliography:Application Number: TW20132130484