Projection exposure system and projection exposure method

A projection exposure system comprises an illumination system (ILL) configured to receive primary radiation with operating wavelength generated by a primary radiation source (S) and to form the primary radiation to generate illumination radiation incident on a mask (M) providing a prescribed pattern...

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Bibliographic Details
Main Authors BEIERL, HELMUT, GRAESCHUS, VOLKER, ULRICH, WILHELM, GRUNER, TORALF, GRAEUPNER, PAUL, ZACZEK, CHRISTOPH, CONRADI, OLAF
Format Patent
LanguageChinese
English
Published 16.08.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A projection exposure system comprises an illumination system (ILL) configured to receive primary radiation with operating wavelength generated by a primary radiation source (S) and to form the primary radiation to generate illumination radiation incident on a mask (M) providing a prescribed pattern (PAT) and a projection objective (PO) configured to project an image of the pattern arranged in an object surface (OS) of the projection objective onto a radiation-sensitive substrate (W) arranged in an image surface (IS) of the projection objective at an image-side numerical aperture NA. An angle-selective filter arrangement (FA) is arranged in a filter plane at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function. The filter function comprises a pass band (PB) with relatively high transmi
Bibliography:Application Number: TW20110134770