Gas baffle and distributor for semiconductor processing chamber

Techniques of the present invention are directed to distribution of deposition gases onto a substrate. In one embodiment, a gas distributor for use in a processing chamber is provided. The gas distributor includes a body having a gas deflecting surface and a gas distributor face. The gas deflecting...

Full description

Saved in:
Bibliographic Details
Main Authors SUN, DAVID P, BANG, WON B, WANG, YEN-KUN VICTOR, GIANOULAKIS, STEVEN E, LU, SI-QING, LEI, LAWRENCE CHUNG-LAI
Format Patent
LanguageChinese
English
Published 16.10.2006
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
Online AccessGet full text

Cover

More Information
Summary:Techniques of the present invention are directed to distribution of deposition gases onto a substrate. In one embodiment, a gas distributor for use in a processing chamber is provided. The gas distributor includes a body having a gas deflecting surface and a gas distributor face. The gas deflecting surface defines a cleaning gas pathway. The gas distributor face is disposed on an opposite side of the body from the gas deflecting surface and faces toward a substrate support member. The gas distributor face includes a raised step and at least one set of apertures through the raised step. The at least one set of apertures are adapted to distribute a deposition gas over a substrate positioned on the substrate support member.
Bibliography:Application Number: TW20060107650