Alkali-soluble resin and photosensitive composition comprising the resin

An alkali-soluble resin having a polyaromatic group and a photosensitive composition comprising the alkali-soluble resin. The alkali-soluble resin comprises the following recurring units: , wherein each of R1, R2, and R3, independently, is H or CH3; R4 is a substituted or unsubstituted polyaromatic...

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Bibliographic Details
Main Authors HUANG, KUO-TUNG, CHAO, SHI-DEH, CHANG, MON-HAW, CHENG, I-JEIN
Format Patent
LanguageChinese
English
Published 16.06.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An alkali-soluble resin having a polyaromatic group and a photosensitive composition comprising the alkali-soluble resin. The alkali-soluble resin comprises the following recurring units: , wherein each of R1, R2, and R3, independently, is H or CH3; R4 is a substituted or unsubstituted polyaromatic derivative containing carbon and optionally containing one or more heteroatoms of oxygen, nitrogen and sulfur; X is alkyl, benzyl, or hydroxyl; each of n1 and n2, independently, is an integer of 0-8; and a, b, and c are integers when a and c respectively are not zero.
Bibliography:Application Number: TW20040137778