Evaluating method and method for manufacturing exposure apparatus

• Main Authors: TAKEDA, KANAME, HAYASHI, TSUNEHITO
• Format: Patent
• Language: Chinese; English
• Published: 16.08.2003
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A pattern formation member where a predetermined pattern is formed is placed on a first surface, a photosensitive body having a physical property concerning color such as the color density variable with the amount of energy of an energy beam applied is placed on a second surface, and the pattern is...