Evaluating method and method for manufacturing exposure apparatus

• Main Authors: TAKEDA, KANAME, HAYASHI, TSUNEHITO
• Format: Patent
• Language: Chinese; English
• Published: 16.08.2003
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A pattern formation member where a predetermined pattern is formed is placed on a first surface, a photosensitive body having a physical property concerning color such as the color density variable with the amount of energy of an energy beam applied is placed on a second surface, and the pattern is transferred to the photosensitive body through a projection optical system by applying an energy beam to the pattern formation member (step 413). The image of the pattern is detected according to the change of the physical property of the photosensitive body, such as the presence/absence of color, and the state of formation of the image of the pattern is extracted according to the results of the detection (step 423). A characteristic of an exposure apparatus is evaluated from the state of formation of the image (step 429).