MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS

• Main Authors: CHKHALO, NIKOLAY, SALASCHENKO, NIKOLAI, SJMAENOK, LEONID, BANINE, VADIM, GLUSHKOV, DENIS
• Format: Patent
• Language: English
• Published: 28.10.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; GAMMA RAY OR X-RAY MICROSCOPES; HOLOGRAPHY; IRRADIATION DEVICES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOTECHNOLOGY; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR; TRANSPORTING

A multilayer mirror (7) is constructed and arranged to reflect radiation having a wavelength in the range of 2-8 nm. The multilayer mirror has alternating layers (4, 6), the alternating layers comprising a first layer and a second layer, the first and second layers being selected from the group consisting of : U and B4C layers, Th and B4C layers, La and B9C layers, La and B4C layers, U and B9C layers, Th and B9C layers, La and B layers, U and B layers, C and B layers, Th and B layers, U compound and B4C layers, Th compound and B4C layers, La compound and B9C layers, La compound and B4C layers, U compound and a B9C layers, Th compound and a B9C layers, La compound and a B layers, U compound and B layers, and Th compound and a B layers, wherein at least one of the first layers is separated from the second layer by an interlayer (7) disposed between at least one of the first layers and the second layer.