ROTATING TEMPERATURE CONTROLLED SUBSTRATE PEDESTAL FOR FILM UNIFORMITY

Substrate processing systems are described. The systems may include a processing chamber, and a substrate support assembly at least partially disposed within the chamber. The substrate support assembly is rotatable by a motor yet still allows electricity, cooling fluids, gases and vacuum to be trans...

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Bibliographic Details
Main Authors LUBOMIRSKY DMITRY, FLOYD KIRBY H
Format Patent
LanguageEnglish
Published 29.05.2009
Subjects
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