FILM FORMING METHOD AND ALUMINUM NITRIDE FILM FORMING METHOD FOR SEMICONDUCTOR APPARATUS

• Main Authors: GENG, Yujie, WANG, Jun, GUO, Bingliang, MA, Huaichao, DONG, Boyu
• Format: Patent
• Language: English
• Published: 28.12.2018
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Provided are a film forming method of a semiconductor device and an aluminium nitride film forming method of a semiconductor device. The film forming method of a semiconductor device comprises performing multiple sputtering processes in sequence. Each sputtering process comprises the steps of: loadi...