ATOMIC LAYER DEPOSITION CHAMBER WITH FUNNEL-SHAPED GAS DISPERSION CHANNEL AND GAS DISTRIBUTION PLATE

• Main Authors: JIAN, Guoqiang, SANCHEZ, Mario Dan, YANG, Yixiong, AGARWAL, Ashutosh, RASHEED, Muhammad, JADHAV, Deepak, GANDIKOTA, Srinivas
• Format: Patent
• Language: English
• Published: 30.12.2021

Apparatus for processing a substrate are provided herein. In some embodiments, a lid for a substrate processing chamber includes: a lid plate comprising an upper surface and a contoured bottom surface, the upper surface having a central opening and the contoured bottom surface having a first portion...