FOTOPOLYMERISERBARA OVERDRAGSMEDEL

• Main Authors: 2)R DHEIN, 1)H RUDOLPH, 3)E DE CLEUR, 5)A HAUS, 4)K FUHR
• Format: Patent
• Language: Swedish
• Published: 16.07.1984
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; ELECTROGRAPHY; FILLING PASTES; HOLOGRAPHY; INKS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

Process for obtaining photopolymerizable coating means, which optionally contain solvents, dyes, pigments and other auxiliary means for conventional lacquers, characterized in that they are polymerized A) 70-99% by weight of at least one photopolymerizable compound containing at least one light-curing, ethylenically unsaturated c-c double bond B) 1 - 30% by weight of at least one aminoplast resin In the presence of 0.1-20% by weight, based on the sum of a) b), of at least two photoinitiators, one of the photoinitiators having one or more acid-forming acid groups incorporated during photopolymerization and, at least, one of the photoinitiators is free of such acidic groups. (Machine-translation by Google Translate, not legally binding)