SUBSTRATES AND METHODS OF USING THOSE SUBSTRATES

A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chem...

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Bibliographic Details
Main Authors JIMMY MATHEUS WILHELMUS VAN DE WINKEL, CHRISTOPHER JOHN MASON, MATTHEW LIPSON, BERT DIRK SCHOLTEN, DAMOON SOHRABIBABAHEIDARY
Format Patent
LanguageEnglish
Published 04.12.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part 5 of the apparatus by chemical reaction between the material and the contamination.
Bibliography:Application Number: NL20182020847