ALIGNMENT SENSOR FOR LITHOGRAPHIC APPARATUS

• Main Authors: SCOTT DOUGLAS COSTON, RONAN JAMES HAVELIN, ALESSANDRO POLO, PATRICIUS ALOYSIUS JACOBUS TINNEMANS, SIMON GIJSBERT JOSEPHUS MATHIJSSEN
• Format: Patent
• Language: English
• Published: 21.03.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target comprising a periodic structure. The alignment sensor includes a demultiplexer to demultiplex a number of intensity channels. The demultiplexer includes a number of stages arranged in se...