ALIGNMENT SENSOR FOR LITHOGRAPHIC APPARATUS

A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target comprising a periodic structure. The alignment sensor includes a demultiplexer to demultiplex a number of intensity channels. The demultiplexer includes a number of stages arranged in se...

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Bibliographic Details
Main Authors SCOTT DOUGLAS COSTON, RONAN JAMES HAVELIN, ALESSANDRO POLO, PATRICIUS ALOYSIUS JACOBUS TINNEMANS, SIMON GIJSBERT JOSEPHUS MATHIJSSEN
Format Patent
LanguageEnglish
Published 21.03.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target comprising a periodic structure. The alignment sensor includes a demultiplexer to demultiplex a number of intensity channels. The demultiplexer includes a number of stages arranged in series and a number of demultiplexing components, each demultiplexing component being operable to divide an input radiation beam into two radiation beam portions. The first stage has a first demultiplexing component that is arranged to receive as an input radiation beam an incident radiation beam. Each successive stage is arranged such that it has twice the number of demultiplexing components as a preceding stage, each demultiplexing component of each stage after the first stage receiving as an input one of the radiation beam portions output from a demultiplexing component of the preceding stage.
Bibliography:Application Number: NL20162017348