METHOD AND ARRANGEMENT FOR THE ADJUSTMENT OF CHARACTERISTICS OF A BEAM BUNDLE OF HIGH-ENERGY RADIATION EMITTED FROM A PLASMA

The invention is related to the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma, particularly for applications in semiconductor lithography. For acquiring and adjusting characteristics of a beam bundle of high-energy radiation emitted from a plasma and f...

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Main Authors KELLER, ALEXANDER, SCHRIEVER, GUIDO, SCHUERMANN, MAX CHRISTIAN, KLEINSCHMIDT, JUERGEN, BOLSHUKHIN, DENIS, AHMAD, IMTIAZ
Format Patent
LanguageEnglish
Published 02.10.2012
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Abstract The invention is related to the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma, particularly for applications in semiconductor lithography. For acquiring and adjusting characteristics of a beam bundle of high-energy radiation emitted from a plasma and focused by means of collector optics, an intensity distribution of the radiation is acquired over the cross section of a convergent beam bundle in a measuring plane perpendicular to the optical axis in front of an intermediate focus of the collector optics, and intensity values are recorded in defined sectors for a quantity of reception regions of a measuring device which are aligned with different radii concentric to the optical axis, and measured quantities and control variables are determined from a comparison of the intensity values of different sectors for aligning the collector optics.
AbstractList The invention is related to the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma, particularly for applications in semiconductor lithography. For acquiring and adjusting characteristics of a beam bundle of high-energy radiation emitted from a plasma and focused by means of collector optics, an intensity distribution of the radiation is acquired over the cross section of a convergent beam bundle in a measuring plane perpendicular to the optical axis in front of an intermediate focus of the collector optics, and intensity values are recorded in defined sectors for a quantity of reception regions of a measuring device which are aligned with different radii concentric to the optical axis, and measured quantities and control variables are determined from a comparison of the intensity values of different sectors for aligning the collector optics.
Author KLEINSCHMIDT, JUERGEN
BOLSHUKHIN, DENIS
KELLER, ALEXANDER
SCHUERMANN, MAX CHRISTIAN
AHMAD, IMTIAZ
SCHRIEVER, GUIDO
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– fullname: KLEINSCHMIDT, JUERGEN
– fullname: BOLSHUKHIN, DENIS
– fullname: AHMAD, IMTIAZ
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Snippet The invention is related to the adjustment of characteristics of a beam bundle of high-energy radiation emitted from a plasma, particularly for applications in...
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
MEASURING
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TESTING
TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES
TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
Title METHOD AND ARRANGEMENT FOR THE ADJUSTMENT OF CHARACTERISTICS OF A BEAM BUNDLE OF HIGH-ENERGY RADIATION EMITTED FROM A PLASMA
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