PROCESS FOR PRODUCING POLISHING LIQUID COMPOSITION

PROVIDED IS A PROCESS FOR PRODUCING A POLISHING LIQUID COMPOSITION WITH WHICH IT IS POSSIBLE TO GIVE A POLISHED WORK THAT HAS A REDUCED SURFACE ROUGHNESS AND A REDUCED AMOUNT OF PARTICLES. THE PROCESS FOR PRODUCING A POLISHING LIQUID COMPOSITION INVOLVES A STEP IN WHICH A RAW SILICA DISPERSION CONTA...

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Bibliographic Details
Main Authors SATO, Kanji, YONEDA, YASUHIRO, OSHIMA, Yoshiaki, TAIRA, Koji
Format Patent
LanguageEnglish
Published 15.03.2017
Subjects
ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMISTRY
DRESSING OR CONDITIONING OF ABRADING SURFACES
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PERFORMING OPERATIONS
PHYSICS
POLISHES
POLISHING
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH
SEMICONDUCTOR DEVICES
SKI WAXES
TRANSPORTING
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Summary:PROVIDED IS A PROCESS FOR PRODUCING A POLISHING LIQUID COMPOSITION WITH WHICH IT IS POSSIBLE TO GIVE A POLISHED WORK THAT HAS A REDUCED SURFACE ROUGHNESS AND A REDUCED AMOUNT OF PARTICLES. THE PROCESS FOR PRODUCING A POLISHING LIQUID COMPOSITION INVOLVES A STEP IN WHICH A RAW SILICA DISPERSION CONTAINING COLLOIDAL SILICA HAVING AN AVERAGE PRIMARY-PARTICLE DIAMETER OF 1-100 NM IS FILTERED THROUGH A FILTER INCLUDING A FILTER AID, THE FILTER AID HAVING AN AVERAGE PORE DIAMETER, AS MEASURED BY THE MERCURY INTRUSION METHOD, OF 0.1-3.5 µM.
Bibliography:Application Number: MY2013PI00469