다이아몬드 막 증착을 위한 기상 전구체 시딩

• Main Authors: SAHMUGANATHAN VICKNESH, VENKATASUBRAMANIAN ESWARANAND, GU JITENG, LOH KIAN PING, SUDIJONO JOHN, TAN SZE CHIEH, MALLICK ABHIJIT BASU
• Format: Patent
• Language: Korean
• Published: 06.08.2024
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

집적 회로들의 제조에 사용될 수 있는, 아다만탄 막을 증착시키는 방법들이 설명된다. 방법들은, 아다만탄 시드 층이 기판 상에 증착되고, 아다만탄 시드 층에 비해 증가된 결정화도를 갖는 다이아몬드 핵 층으로 변환된 다음, 다이아몬드 핵 층으로부터 완전한 나노결정질 다이아몬드 막으로 성장되는, 기판을 처리하는 단계를 포함한다. Methods of depositing an adamantane film are described, which may be used in the manufacture of integrated circuits. Methods include processing a substrate in which an adamantane seed layer is deposited on a substrate, converting to a diamond nuclei layer having an increased crystallinity relative to the adamantane seed layer and then grown into full nanocrystalline diamond film from the diamond nuclei layer.