유기주석 전구체 화합물

• Main Authors: CAMERON THOMAS M, ERMERT DAVID M, KUIPER DAVID
• Format: Patent
• Language: Korean
• Published: 19.07.2024
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

본 발명은 주석-함유 필름의 마이크로전자 디바이스 기판의 표면 상에의 증기 침착에, 뿐만 아니라 EUV-패터닝가능한 필름의 침착에 유용한 것으로 여겨지는 특정 유기주석 화합물을 제공한다. 또한 특정 신규한 전구체 조성물이 제공된다. 또한 신규한 전구체를 사용하여 필름을 형성하는 방법이 개시된다. The invention provides certain organotin compounds which are believed to be useful in the vapor deposition of tin-containing films onto the surface of microelectronic device substrates, as well as in the deposition of EUV-patternable films. Also provided are certain novel precursor compositions. Also disclosed are processes for using the novel precusors to form films.