감광성 조성물

• Main Authors: SHIOTA DAI, URAKAWA KAZUKI
• Format: Patent
• Language: Korean
• Published: 08.05.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS

라디칼 중합성 화합물 (A) 와, 라디칼 중합 개시제 (C) 를 포함하고, 가열되어도, 감광성 조성물의 용매 이외의 성분의 중량이나, 경화물의 중량의 과도한 감소가 발생하기 어려워, 양호한 경화성을 나타내는 감광성 조성물과, 당해 감광성 조성물의 경화물을 제공한다. 라디칼 중합성 화합물 (A) 와, 라디칼 중합 개시제 (C) 를 포함하는 감광성 조성물에 있어서, 라디칼 중합성 화합물 (A) 로서, 라디칼 중합성기 함유기를 갖는 특정한 구조의 화합물과, 당해 특정한 구조의 화합물은 상이한 라디칼 중합성 화합물을 조합하여 사용한다. Provided are: a photosensitive composition which contains a radical-polymerizable compound (A) and a radical polymerization initiator (C), and which, even if heated, does not undergo excessive reduction in terms of weight of components other than a solvent in the photosensitive composition or weight of a cured product, and which exhibits a good curing properties; and a cured product of the photosensitive composition.　In this photosensitive composition which contains the radical-polymerizable compound (A) and the radical polymerization initiator (C), a combination of a compound having a specific structure having a radical-polymerizable group-containing group and a radical-polymerizable compound that is different from the compound having the specific structure is used as the radical-polymerizable compound (A).