2-Hydroxy-succinic acid Chemically amplified positive photoresist composition containing 2-Hydroxy-succinic acid - LEE SU JIN; LEE SEUNG HYUN; CHOI YOUNG CHEOL; LEE SEUNG HUN (2024)
Keywords: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS