CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE

• Main Authors: SERIZAWA KOHEI, GO CHOITSU, WADA YUKIHISA, WAKIYA KAZUMASA
• Format: Patent
• Language: English; Korean
• Published: 05.07.2023
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

The present invention relates to a cleaning liquid to reduce a corrosion potential difference between metals and a method for cleaning a substrate. According to the present invention, the substrate comprises a first metal atom-containing layer containing ruthenium and a second metal atom-containing layer containing metal atoms except for ruthenium are in contact with the first metal atom-containing layer. The cleaning liquid cleans the substrate on which at least one of the first metal atom-containing layer and the second metal atom-containing layer is exposed on the surface. The cleaning liquid comprises: at least one hydrazine compound (A) selected from a group consisting of a compound represented by the chemical formula (a1) and a hydrate and salt thereof; and at least one basic compound (B) selected from a group consisting of amines except for the hydrazine compound (A) and quaternary hydroxides, wherein R^1 and R^2 independently represent an organic group not containing a carbonyl group or a hydrogen atom, respectively. 루테늄을 함유하는 제 1 금속 원자 함유층과 루테늄 이외의 금속 원자를 함유하는 제 2 금속 원자 함유층이 접촉하여 존재하는 기판으로서, 상기 제 1 금속 원자 함유층 및 상기 제 2 금속 원자 함유층의 적어도 일방이 표면에 노출된 기판을 세정하기 위한 세정액. 하기 식 (a1) 로 나타내는 화합물, 상기 화합물의 수화물, 및 상기 화합물의 염으로 이루어지는 군에서 선택되는 적어도 1 종의 하이드라진 화합물 (A) 와, 상기 하이드라진 화합물 (A) 이외의 아민, 및 제 4 급 수산화물로 이루어지는 군에서 선택되는 적어도 1 종의 염기성 화합물 (B) 를 포함한다. R1 및 R2 는, 카르보닐기를 포함하지 않는 유기기 또는 수소 원자를 나타낸다. JPEGpat00019.jpg3482