폴리싱 패드 및 이를 사용하는 시스템 및 방법

폴리싱 패드는 작업 표면 및 작업 표면 반대편의 제2 표면을 포함하는 텍스처화된 폴리싱 층을 포함한다. 텍스처화된 폴리싱 층은 텍스처화된 폴리싱 층의 총 중량을 기준으로 40 내지 95 중량%의 양의 열가소성 우레탄 및 5 내지 60 중량%의 양의 스티렌계 공중합체를 포함하는 중합체 블렌드를 포함한다. A polishing pad includes a textured polishing layer comprising a working surface and a second surface opposite the working surface...

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Bibliographic Details
Main Authors LEHUU DUY K, RULE JOSEPH D, COAD ERIC C
Format Patent
LanguageKorean
Published 28.02.2023
Subjects
DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TOOLS FOR GRINDING, BUFFING, OR SHARPENING
TRANSPORTING
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Abstract 폴리싱 패드는 작업 표면 및 작업 표면 반대편의 제2 표면을 포함하는 텍스처화된 폴리싱 층을 포함한다. 텍스처화된 폴리싱 층은 텍스처화된 폴리싱 층의 총 중량을 기준으로 40 내지 95 중량%의 양의 열가소성 우레탄 및 5 내지 60 중량%의 양의 스티렌계 공중합체를 포함하는 중합체 블렌드를 포함한다. A polishing pad includes a textured polishing layer comprising a working surface and a second surface opposite the working surface. The textured polishing layer comprises a polymeric blend comprising thermoplastic urethane in an amount of between 40 and 95 wt. %, and styrenic copolymer in an amount of between 5 and 60 wt. %, based on the total weight of the textured polishing layer.
AbstractList 폴리싱 패드는 작업 표면 및 작업 표면 반대편의 제2 표면을 포함하는 텍스처화된 폴리싱 층을 포함한다. 텍스처화된 폴리싱 층은 텍스처화된 폴리싱 층의 총 중량을 기준으로 40 내지 95 중량%의 양의 열가소성 우레탄 및 5 내지 60 중량%의 양의 스티렌계 공중합체를 포함하는 중합체 블렌드를 포함한다. A polishing pad includes a textured polishing layer comprising a working surface and a second surface opposite the working surface. The textured polishing layer comprises a polymeric blend comprising thermoplastic urethane in an amount of between 40 and 95 wt. %, and styrenic copolymer in an amount of between 5 and 60 wt. %, based on the total weight of the textured polishing layer.
Author LEHUU DUY K
COAD ERIC C
RULE JOSEPH D
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Snippet 폴리싱 패드는 작업 표면 및 작업 표면 반대편의 제2 표면을 포함하는 텍스처화된 폴리싱 층을 포함한다. 텍스처화된 폴리싱 층은 텍스처화된 폴리싱 층의 총 중량을 기준으로 40 내지 95 중량%의 양의 열가소성 우레탄 및 5 내지 60 중량%의 양의 스티렌계 공중합체를 포함하는 중합체...
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SubjectTerms DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TOOLS FOR GRINDING, BUFFING, OR SHARPENING
TRANSPORTING
Title 폴리싱 패드 및 이를 사용하는 시스템 및 방법
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