CLEANING COMPOSITION METHOD OF CLEANING COATING FILM FORMING DEVICE METHOD OF PRODUCING SUBSTRATE FOR LITHOGRAPHY AND METHOD OF FORMING RESIST PATTERN

• Main Authors: ISHIKAWA TATSURO, FUJII TATSUYA
• Format: Patent
• Language: English; Korean
• Published: 15.12.2022
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

The present invention relates to a cleaning composition used for cleaning a coating film forming device, which is characterized by containing an acid component of which pKa is 12 or less. The cleaning composition of the present invention can efficiently remove particles contained in semiconductor manufacturing equipment. 도포 성막 장치의 세정에 사용되는 세정 조성물로서, pKa 가 12 이하인 산 성분을 함유하는, 세정 조성물.