BOND PAD STRUCTURE WITH HIGH VIA DENSITY

Various embodiments of the present invention relate to an integrated circuit (IC) chip where a bond pad structure is extended into a cylindrical structure with high via density. For example, an interconnection structure includes a first bond wire disposed on a front surface of a substrate to form a...

Full description

Saved in:
Bibliographic Details
Main Authors YAUNG DUN NIAN, CHIANG YEN TING, LI YU HSIEN, TING SHYH FANN, LIU JEN CHENG
Format Patent
LanguageEnglish
Korean
Published 24.11.2022
Subjects
Online AccessGet full text

Cover

Loading…
Abstract Various embodiments of the present invention relate to an integrated circuit (IC) chip where a bond pad structure is extended into a cylindrical structure with high via density. For example, an interconnection structure includes a first bond wire disposed on a front surface of a substrate to form a cylindrical structure, a second bond wire, and a bond via. The bond via extends from the first bond wire to the second bond wire. The bond pad structure is extended into the first bond wire by being inserted into a rear surface of the substrate opposite to a front surface. A protrusion portion of the first or second bond wire on a plane parallel to a surface of an upper part of the semiconductor substrate has a first area, and a protrusion portion of the bond via on the plane has a second area representing 10% or more of the first area, thereby having high via density. 본 개시의 다양한 실시예는 본드 패드 구조물이 높은 비아 밀도를 갖는 기둥형 구조물로 연장되는 집적 회로(IC) 칩에 관한 것이다. 예를 들어, 상호접속 구조물은 기판의 전면 상에 있고 기둥형 구조물을 형성하는 제1 본드 와이어, 제2 본드 와이어 및 본드 비아를 포함한다. 본드 비아는 제1 본드 와이어로부터 제2 본드 와이어까지 연장된다. 본드 패드 구조물은 전면 반대편에 있는 기판의 후면에 삽입되어 제1 본드 와이어까지 연장된다. 반도체 기판의 상부 표면에 평행한 평면 상의 제1 또는 제2 본드 와이어의 돌출부는 제1 영역을 갖고, 평면 상의 본드 비아의 돌출부는 제1 영역의 10% 이상인 제2 영역을 가져서, 비아 밀도가 높다.
AbstractList Various embodiments of the present invention relate to an integrated circuit (IC) chip where a bond pad structure is extended into a cylindrical structure with high via density. For example, an interconnection structure includes a first bond wire disposed on a front surface of a substrate to form a cylindrical structure, a second bond wire, and a bond via. The bond via extends from the first bond wire to the second bond wire. The bond pad structure is extended into the first bond wire by being inserted into a rear surface of the substrate opposite to a front surface. A protrusion portion of the first or second bond wire on a plane parallel to a surface of an upper part of the semiconductor substrate has a first area, and a protrusion portion of the bond via on the plane has a second area representing 10% or more of the first area, thereby having high via density. 본 개시의 다양한 실시예는 본드 패드 구조물이 높은 비아 밀도를 갖는 기둥형 구조물로 연장되는 집적 회로(IC) 칩에 관한 것이다. 예를 들어, 상호접속 구조물은 기판의 전면 상에 있고 기둥형 구조물을 형성하는 제1 본드 와이어, 제2 본드 와이어 및 본드 비아를 포함한다. 본드 비아는 제1 본드 와이어로부터 제2 본드 와이어까지 연장된다. 본드 패드 구조물은 전면 반대편에 있는 기판의 후면에 삽입되어 제1 본드 와이어까지 연장된다. 반도체 기판의 상부 표면에 평행한 평면 상의 제1 또는 제2 본드 와이어의 돌출부는 제1 영역을 갖고, 평면 상의 본드 비아의 돌출부는 제1 영역의 10% 이상인 제2 영역을 가져서, 비아 밀도가 높다.
Author LI YU HSIEN
LIU JEN CHENG
TING SHYH FANN
CHIANG YEN TING
YAUNG DUN NIAN
Author_xml – fullname: YAUNG DUN NIAN
– fullname: CHIANG YEN TING
– fullname: LI YU HSIEN
– fullname: TING SHYH FANN
– fullname: LIU JEN CHENG
BookMark eNrjYmDJy89L5WTQcPL3c1EIcHRRCA4JCnUOCQ1yVQj3DPFQ8PB091AI83RUcHH1C_YMieRhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHeQUYGRkYGhqamFpZmjsbEqQIAeBUmng
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
DocumentTitleAlternate 높은 비아 밀도를 갖는 본드 패드 구조물
ExternalDocumentID KR20220155896A
GroupedDBID EVB
ID FETCH-epo_espacenet_KR20220155896A3
IEDL.DBID EVB
IngestDate Fri Jul 19 13:10:03 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
Korean
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_KR20220155896A3
Notes Application Number: KR20220027444
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221124&DB=EPODOC&CC=KR&NR=20220155896A
ParticipantIDs epo_espacenet_KR20220155896A
PublicationCentury 2000
PublicationDate 20221124
PublicationDateYYYYMMDD 2022-11-24
PublicationDate_xml – month: 11
  year: 2022
  text: 20221124
  day: 24
PublicationDecade 2020
PublicationYear 2022
RelatedCompanies TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
RelatedCompanies_xml – name: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
Score 3.4062493
Snippet Various embodiments of the present invention relate to an integrated circuit (IC) chip where a bond pad structure is extended into a cylindrical structure with...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title BOND PAD STRUCTURE WITH HIGH VIA DENSITY
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221124&DB=EPODOC&locale=&CC=KR&NR=20220155896A
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_mFPVNp-LHlIBSfCmONuvHw5C2aW0da0vXzfk00jYFUdxwFf99k9LpnvaW5ODyAffxS-4uAHcGLXDBdYBsljqVscJ0OVPUUjZUrBsZ05hOBVAchZo_wc-z_qwFH-tcmLpO6E9dHJFLVM7lvar19fL_EovUsZWrh-yNDy0evXRApAYdKxzOKFgi9sCNIxI5kuMMhokUJjVNuAeGqVk7sCscaVFp353aIi9luWlUvCPYizm_z-oYWu-LDhw467_XOrA_ap68ebORvtUJ3NtRSFBsETROk4kjAhbQS5D6yA-efDQNLETccBykr6dw67mp48t8yvnfDufDZHN96hm0OfZn54CwTgWAUkpqmrif9SjTc25BVMpxWS8v2AV0t3G63E6-gkPRFal1Cu5Cu_r6ZtfcxlbZTX00vxW1esQ
link.rule.ids 230,309,786,891,25594,76906
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8gGvFNUeMHahPN4ssi2cq6PRAD63BzMJYxEJ-WDrrEaITIjP--7TKUJ96aXnJtL7mPX3t3Bbgz2RzPhQ1QrYwwFWucqKmmZ6qpY2Km3OCESaA4CAx3jJ-nrWkFPta1MEWf0J-iOaLQqJnQ97yw18v_Syxa5FauHtI3MbV47MVtqpToWBNwRsMK7badcEiHtmLbbT9SgqigyfDAtIzODuwS2Z9XBk-TrqxLWW46ld4h7IWC32d-BJX3RR1q9vrvtTrsD8onbzEstW91DPfdYUBR2KFoFEdjWyYsoBcvdpHrPblo4nUQdYKRF7-ewG3PiW1XFUsmfydM_Ghzf_opVAX252eAMGESQGkZsyzcSpuMk5nwIDoTuKw5m_NzaGzjdLGdfAM1Nx70k74X-JdwIEmyzE7DDajmX9_8SvjbPL0uxPQL-659sQ
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=BOND+PAD+STRUCTURE+WITH+HIGH+VIA+DENSITY&rft.inventor=YAUNG+DUN+NIAN&rft.inventor=CHIANG+YEN+TING&rft.inventor=LI+YU+HSIEN&rft.inventor=TING+SHYH+FANN&rft.inventor=LIU+JEN+CHENG&rft.date=2022-11-24&rft.externalDBID=A&rft.externalDocID=KR20220155896A