EUV 리소그라피용 마스크를 검사하기 위한 시스템 및 방법

머신 러닝을 기초로 한 잠재적인 마스크 결함의 사전-분류가 EUV 리소그라피용 마스크의 검사 동안 제공된다. A pre-classification of potential mask defects on the basis of machine learning is provided during the inspection of a mask for EUV lithography.

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Bibliographic Details
Main Author CAPELLI RENZO
Format Patent
LanguageKorean
Published 08.11.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract 머신 러닝을 기초로 한 잠재적인 마스크 결함의 사전-분류가 EUV 리소그라피용 마스크의 검사 동안 제공된다. A pre-classification of potential mask defects on the basis of machine learning is provided during the inspection of a mask for EUV lithography.
AbstractList 머신 러닝을 기초로 한 잠재적인 마스크 결함의 사전-분류가 EUV 리소그라피용 마스크의 검사 동안 제공된다. A pre-classification of potential mask defects on the basis of machine learning is provided during the inspection of a mask for EUV lithography.
Author CAPELLI RENZO
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Snippet 머신 러닝을 기초로 한 잠재적인 마스크 결함의 사전-분류가 EUV 리소그라피용 마스크의 검사 동안 제공된다. A pre-classification of potential mask defects on the basis of machine learning is provided during...
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SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title EUV 리소그라피용 마스크를 검사하기 위한 시스템 및 방법
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