ETCHING METHOD

• Main Authors: HIGUCHI KAZUHITO, OBATA SUSUMU, TAJIMA TAKAYUKI, SANO MITSUO
• Format: Patent
• Language: English; Korean
• Published: 27.09.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

In etching using a catalyst, the present invention makes it difficult for processing defects to occur. An etching method of an embodiment comprises: preparing a plurality of openings or one or more openings for defining a plurality of island-shaped units in a part for covering a first area on a subs...