Plasma reaction apparatus
The present invention relates to a plasma reaction device capable of strongly fixing a container by using an inlet unit and an outlet unit. The plasma reaction device can maintain airtightness for a long time by improving adhesion of a first O-ring and a second O-ring. The Plasma reaction device inc...
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| Main Author | |
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| Format | Patent |
| Language | English Korean |
| Published |
13.07.2022
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| Subjects | |
| Online Access | Get full text |
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| Abstract | The present invention relates to a plasma reaction device capable of strongly fixing a container by using an inlet unit and an outlet unit. The plasma reaction device can maintain airtightness for a long time by improving adhesion of a first O-ring and a second O-ring. The Plasma reaction device includes: a container having a gas inflow unit on one side and a plasma discharge unit on the other side; a first cooling jacket and a second cooling jacket installed on each of both surfaces of the container; an inlet unit maintaining the airtightness by pressurizing a first flange unit formed in the gas inflow unit, and coupled to one side of the first cooling jacket and the second cooling jacket in an insulation state; and an outlet unit maintaining the airtightness by pressurizing the second flange unit formed in the plasma discharge unit, and coupled to the other side of the first cooling jacket and the second cooling jacket in the insulation state. Gas flows into the gas inflow unit of the container, and the plasma is discharged from the plasma discharge unit. The container also includes a ring-shaped plasma loop space therein.
본 발명은 인렛부와 아웃렛부를 이용하여 용기를 견고하게 고정시킬 수 있는 플라즈마 반응 장치에 관한 것으로서, 일측에 가스가 유입되는 가스 유입부가 형성되고, 타측에 형성된 플라즈마가 배출되는 플라즈마 배출부가 형성되며, 내부에 환형의 플라즈마 루프 공간이 형성되는 용기; 상기 용기의 양면 각각에 설치되는 제 1 냉각 자켓 및 제 2 냉각 자켓; 상기 가스 유입부에 형성된 제 1 플랜지부를 가압하여 기밀을 유지시키되, 상기 제 1 냉각 자켓 및 제 2 냉각 자켓의 일측에 절연 상태로 체결되는 인렛부; 및 상기 플라즈마 배출부에 형성된 제 2 플랜지부를 가압하여 기밀을 유지시키되, 상기 제 1 냉각 자켓 및 제 2 냉각 자켓의 타측에 절연 상태로 체결되는 아웃렛부;를 포함할 수 있다. |
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| AbstractList | The present invention relates to a plasma reaction device capable of strongly fixing a container by using an inlet unit and an outlet unit. The plasma reaction device can maintain airtightness for a long time by improving adhesion of a first O-ring and a second O-ring. The Plasma reaction device includes: a container having a gas inflow unit on one side and a plasma discharge unit on the other side; a first cooling jacket and a second cooling jacket installed on each of both surfaces of the container; an inlet unit maintaining the airtightness by pressurizing a first flange unit formed in the gas inflow unit, and coupled to one side of the first cooling jacket and the second cooling jacket in an insulation state; and an outlet unit maintaining the airtightness by pressurizing the second flange unit formed in the plasma discharge unit, and coupled to the other side of the first cooling jacket and the second cooling jacket in the insulation state. Gas flows into the gas inflow unit of the container, and the plasma is discharged from the plasma discharge unit. The container also includes a ring-shaped plasma loop space therein.
본 발명은 인렛부와 아웃렛부를 이용하여 용기를 견고하게 고정시킬 수 있는 플라즈마 반응 장치에 관한 것으로서, 일측에 가스가 유입되는 가스 유입부가 형성되고, 타측에 형성된 플라즈마가 배출되는 플라즈마 배출부가 형성되며, 내부에 환형의 플라즈마 루프 공간이 형성되는 용기; 상기 용기의 양면 각각에 설치되는 제 1 냉각 자켓 및 제 2 냉각 자켓; 상기 가스 유입부에 형성된 제 1 플랜지부를 가압하여 기밀을 유지시키되, 상기 제 1 냉각 자켓 및 제 2 냉각 자켓의 일측에 절연 상태로 체결되는 인렛부; 및 상기 플라즈마 배출부에 형성된 제 2 플랜지부를 가압하여 기밀을 유지시키되, 상기 제 1 냉각 자켓 및 제 2 냉각 자켓의 타측에 절연 상태로 체결되는 아웃렛부;를 포함할 수 있다. |
| Author | CHOI, DAI KYU |
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| Snippet | The present invention relates to a plasma reaction device capable of strongly fixing a container by using an inlet unit and an outlet unit. The plasma reaction... |
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| Title | Plasma reaction apparatus |
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