SEMICONDUCTOR DEVICE WITH VARYING NUMBERS OF CHANNEL LAYERS AND METHOD OF FABRICATION THEREOF

A method comprises: a step of providing a structure having a front surface and a rear surface, wherein the structure comprises a substrate, two or more semiconductor channel layers, over the substrate, which is connecting a first source/drain (S/D) feature and a second S/D feature, and a gate struct...

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Bibliographic Details
Main Authors CHUNG CHENG TING, CHENG KUAN LUN
Format Patent
LanguageEnglish
Korean
Published 08.12.2021
Subjects
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