SEMICONDUCTOR DEVICE WITH VARYING NUMBERS OF CHANNEL LAYERS AND METHOD OF FABRICATION THEREOF
A method comprises: a step of providing a structure having a front surface and a rear surface, wherein the structure comprises a substrate, two or more semiconductor channel layers, over the substrate, which is connecting a first source/drain (S/D) feature and a second S/D feature, and a gate struct...
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Main Authors | , |
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Format | Patent |
Language | English Korean |
Published |
08.12.2021
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Subjects | |
Online Access | Get full text |
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